Oblique Incidence Interference Method Flatness Tester 'FT-17'
Laser light oblique incidence interferometer compatible with a maximum φ130mm; image analysis using phase shift method.
This involves digitally measuring various samples by analyzing interference fringes obtained from a laser light oblique incidence interferometer using the phase shift method. It is used in research and development of semiconductor wafers (GaN, SiC, sapphire) to improve quality in mass production lines.
- Company：ニデック コート本部
- Price：Other
